Abstract
NiAl coatings doped with 0.5 at.% and 1.5 at.% Hf were produced by co-evaporation of NiAl and Hf ingots by electron beam physical vapor deposition (EB-PVD), respectively. The addition of 0.5 at.% Hf significantly improved the cyclic oxidation resistance of the NiAl coating. The TGO layer in the 1.5 at.% Hf doped NiAl coating is straight; while that in the 0.5 at.% Hf doped coating became undulated after thermal cycling. The doped NiAl thermal barrier coatings (TBCs) revealed improved thermal cycling lifetimes at 1423 K, compared to the undoped TBC. Failure of the 0.5 at.% Hf doped TBC occurred by cracking at the interface between YSZ topcoat and bond coat, while the 1.5 at.% Hf doped TBC cracked at the interface between bond coat and substrate.
| Original language | English |
|---|---|
| Pages (from-to) | 5732-5735 |
| Number of pages | 4 |
| Journal | Thin Solid Films |
| Volume | 516 |
| Issue number | 16 |
| DOIs | |
| State | Published - 30 Jun 2008 |
Keywords
- Electron beam physical vapor deposition (EB-PVD)
- Hafnium
- NiAl
- Oxidation
- Thermal barrier coatings (TBCs)
- Thermal cycling
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