Growth and characterization of TiO2/TiN camouflage films with low infrared emission on polymide substrates

Ye Cao; Xungang Diao; Chao Meng; Jiangle Chen; Baoxia Gu

Growth and characterization of TiO₂/TiN camouflage films with low infrared emission on polymide substrates

Ye Cao
, Xungang Diao^*
, Chao Meng
, Jiangle Chen
, Baoxia Gu

^*Corresponding author for this work

School of Energy and Power Engineering

Beihang University

Research output: Contribution to journal › Article › peer-review

Abstract

The TiO₂/TiN camouflage thin films with Low infrared emission were grown by multi-arc plasma deposition on flexible polymide (PI). The microstructures and properties of the TiO₂/TiN camouflage thin films were characterized with scanning electron microscopy (SEM), infrared emission spectroscopy and ultraviolet visible spectroscopy (UV-Vis). The sputtering time significantly affects the colors of the films in the visible band with good camouflage characteristics. The results show that high quality multi-colored films with low infrared emission can be grown by multi-arc plasma deposition on PI substrate and that the interfacial adhesion is rather strong.

Original language	English
Pages (from-to)	213-217
Number of pages	5
Journal	Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology
Volume	29
Issue number	2
State	Published - Apr 2009

Keywords

Comouflage
Low emissivity
Multi-Arc sputtering
Multilayer thin films

Cite this

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title = "Growth and characterization of TiO2/TiN camouflage films with low infrared emission on polymide substrates",

abstract = "The TiO2/TiN camouflage thin films with Low infrared emission were grown by multi-arc plasma deposition on flexible polymide (PI). The microstructures and properties of the TiO2/TiN camouflage thin films were characterized with scanning electron microscopy (SEM), infrared emission spectroscopy and ultraviolet visible spectroscopy (UV-Vis). The sputtering time significantly affects the colors of the films in the visible band with good camouflage characteristics. The results show that high quality multi-colored films with low infrared emission can be grown by multi-arc plasma deposition on PI substrate and that the interfacial adhesion is rather strong.",

keywords = "Comouflage, Low emissivity, Multi-Arc sputtering, Multilayer thin films",

author = "Ye Cao and Xungang Diao and Chao Meng and Jiangle Chen and Baoxia Gu",

year = "2009",

month = apr,

language = "英语",

volume = "29",

pages = "213--217",

journal = "Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology",

issn = "1672-7126",

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TY - JOUR

T1 - Growth and characterization of TiO2/TiN camouflage films with low infrared emission on polymide substrates

AU - Cao, Ye

AU - Diao, Xungang

AU - Meng, Chao

AU - Chen, Jiangle

AU - Gu, Baoxia

PY - 2009/4

Y1 - 2009/4

N2 - The TiO2/TiN camouflage thin films with Low infrared emission were grown by multi-arc plasma deposition on flexible polymide (PI). The microstructures and properties of the TiO2/TiN camouflage thin films were characterized with scanning electron microscopy (SEM), infrared emission spectroscopy and ultraviolet visible spectroscopy (UV-Vis). The sputtering time significantly affects the colors of the films in the visible band with good camouflage characteristics. The results show that high quality multi-colored films with low infrared emission can be grown by multi-arc plasma deposition on PI substrate and that the interfacial adhesion is rather strong.

AB - The TiO2/TiN camouflage thin films with Low infrared emission were grown by multi-arc plasma deposition on flexible polymide (PI). The microstructures and properties of the TiO2/TiN camouflage thin films were characterized with scanning electron microscopy (SEM), infrared emission spectroscopy and ultraviolet visible spectroscopy (UV-Vis). The sputtering time significantly affects the colors of the films in the visible band with good camouflage characteristics. The results show that high quality multi-colored films with low infrared emission can be grown by multi-arc plasma deposition on PI substrate and that the interfacial adhesion is rather strong.

KW - Comouflage

KW - Low emissivity

KW - Multi-Arc sputtering

KW - Multilayer thin films

UR - https://www.scopus.com/pages/publications/64249098407

M3 - 文章

AN - SCOPUS:64249098407

SN - 1672-7126

VL - 29

SP - 213

EP - 217

JO - Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology

JF - Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology

IS - 2

ER -

Growth and characterization of TiO₂/TiN camouflage films with low infrared emission on polymide substrates

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Keywords

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