Grain Boundary Induced Ultralow Threshold Random Laser in a Single GaTe Flake

  • Zuxin Chen
  • , Yingjun Zhang
  • , Sheng Chu
  • , Rong Sun
  • , Jun Wang
  • , Jiapeng Chen
  • , Bin Wei
  • , Xin Zhang
  • , Weihang Zhou
  • , Yumeng Shi*
  • , Zhongchang Wang
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Random lasing is a lasing phenomenon realized in random media, and it has attracted a great deal of attention in recent years. An essential requirement for strong random lasing is to achieve strong and recurrent scattering among grain boundaries of a disordered structure. Herein, we report a random laser (RL) based on individual polycrystalline GaTe microflakes (MFs) with a lasing threshold of 4.15 kW cm-2, about 1-2 orders of magnitude lower than that of the reported single GaN microwire random laser. The strongly enhanced light scattering and trapping benefit from the reduced grain size in the polycrystalline GaTe MF, resulting in a ultralow threshold. We also investigate the dependence of spatially localized cavities' dimension on the pumping intensity profile and temperature. The findings provide a feasible route to realize RL with a low threshold and small size, opening up a new avenue in fulfilling many potential optoelectronic applications of RL.

Original languageEnglish
Pages (from-to)23323-23329
Number of pages7
JournalACS Applied Materials and Interfaces
Volume12
Issue number20
DOIs
StatePublished - 20 May 2020
Externally publishedYes

Keywords

  • GaTe
  • fast Fourier transform
  • grain boundary
  • random laser
  • ultralow threshold

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