Fabrication of patterned self-assembled monolayers on silicon substrate

Patterned self-assembled monolayers (SAMs) terminated with amine and methyl groups were fabricated using photolithography and self-assembled technique. The deposition of carbon nanotube is conducted by immerging the patterned self-assembled monolayers into the DMF solution with suspended carbon nanotubes. SEM images showed that carbon nanotubes deposit exclusively on the area with amino-terminated self-assembled monolayer, which confirms the difference in surface property on different regions of the patterned SAMS.