Experimental and numerical evaluations of adhesion strength and stress in TiN films deposited on ti-implanted aluminum

Ming Xu; Youming Liu; Liuhe Li; Xun Cai; Qiulong Chen; Paul K. Chu

doi:10.1116/1.2165657

Experimental and numerical evaluations of adhesion strength and stress in TiN films deposited on ti-implanted aluminum

Ming Xu
, Youming Liu
, Liuhe Li
, Xun Cai^*
, Qiulong Chen
, Paul K. Chu

^*Corresponding author for this work

School of Mechanical Engineering and Automation

Shanghai Jiao Tong University
City University of Hong Kong

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

Titanium ions were implanted into aluminum substrates at 40 kV prior to magnetron sputtering deposition of the Ti interlayer and TiN film using our custom-designed multifunctional ion implanter without breaking vacuum. An 82-nm -thick modified layer was formed between the TiN film and the substrate. The characteristics of the implanted samples were compared to those of TiNAl and TiNTiAl samples that were not preimplanted. Based on our scratch tests, the critical loading Lc of the TiNTiTi -implanted Al sample was significantly improved compared to the unimplanted TiNAl and TiNTiAl samples. Finite element analysis was conducted to simulate the scratch process to help reveal the stress distributions in the vicinity of the interlayer. The results show that the stress around the interface is largely reduced in the TiNTiTi -implanted Al sample. Consequently, the mechanical properties such as resistance to loadings are enhanced.

Original language	English
Pages (from-to)	212-217
Number of pages	6
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	24
Issue number	2
DOIs	https://doi.org/10.1116/1.2165657
State	Published - Mar 2006

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title = "Experimental and numerical evaluations of adhesion strength and stress in TiN films deposited on ti-implanted aluminum",

abstract = "Titanium ions were implanted into aluminum substrates at 40 kV prior to magnetron sputtering deposition of the Ti interlayer and TiN film using our custom-designed multifunctional ion implanter without breaking vacuum. An 82-nm -thick modified layer was formed between the TiN film and the substrate. The characteristics of the implanted samples were compared to those of TiNAl and TiNTiAl samples that were not preimplanted. Based on our scratch tests, the critical loading Lc of the TiNTiTi -implanted Al sample was significantly improved compared to the unimplanted TiNAl and TiNTiAl samples. Finite element analysis was conducted to simulate the scratch process to help reveal the stress distributions in the vicinity of the interlayer. The results show that the stress around the interface is largely reduced in the TiNTiTi -implanted Al sample. Consequently, the mechanical properties such as resistance to loadings are enhanced.",

author = "Ming Xu and Youming Liu and Liuhe Li and Xun Cai and Qiulong Chen and Chu, \{Paul K.\}",

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doi = "10.1116/1.2165657",

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TY - JOUR

T1 - Experimental and numerical evaluations of adhesion strength and stress in TiN films deposited on ti-implanted aluminum

AU - Xu, Ming

AU - Liu, Youming

AU - Li, Liuhe

AU - Cai, Xun

AU - Chen, Qiulong

AU - Chu, Paul K.

PY - 2006/3

Y1 - 2006/3

N2 - Titanium ions were implanted into aluminum substrates at 40 kV prior to magnetron sputtering deposition of the Ti interlayer and TiN film using our custom-designed multifunctional ion implanter without breaking vacuum. An 82-nm -thick modified layer was formed between the TiN film and the substrate. The characteristics of the implanted samples were compared to those of TiNAl and TiNTiAl samples that were not preimplanted. Based on our scratch tests, the critical loading Lc of the TiNTiTi -implanted Al sample was significantly improved compared to the unimplanted TiNAl and TiNTiAl samples. Finite element analysis was conducted to simulate the scratch process to help reveal the stress distributions in the vicinity of the interlayer. The results show that the stress around the interface is largely reduced in the TiNTiTi -implanted Al sample. Consequently, the mechanical properties such as resistance to loadings are enhanced.

AB - Titanium ions were implanted into aluminum substrates at 40 kV prior to magnetron sputtering deposition of the Ti interlayer and TiN film using our custom-designed multifunctional ion implanter without breaking vacuum. An 82-nm -thick modified layer was formed between the TiN film and the substrate. The characteristics of the implanted samples were compared to those of TiNAl and TiNTiAl samples that were not preimplanted. Based on our scratch tests, the critical loading Lc of the TiNTiTi -implanted Al sample was significantly improved compared to the unimplanted TiNAl and TiNTiAl samples. Finite element analysis was conducted to simulate the scratch process to help reveal the stress distributions in the vicinity of the interlayer. The results show that the stress around the interface is largely reduced in the TiNTiTi -implanted Al sample. Consequently, the mechanical properties such as resistance to loadings are enhanced.

UR - https://www.scopus.com/pages/publications/33644597279

U2 - 10.1116/1.2165657

DO - 10.1116/1.2165657

M3 - 文章

AN - SCOPUS:33644597279

SN - 0734-2101

VL - 24

SP - 212

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JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 2

ER -

Experimental and numerical evaluations of adhesion strength and stress in TiN films deposited on ti-implanted aluminum

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