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Enhanced shear strength and microstructure of Cu–Cu interconnection by low-temperature sintering of Cu nanoparticles

  • Ze Cui
  • , Qiang Jia
  • , Yishu Wang
  • , Dan Li
  • , Chien Ping Wang
  • , Hongqiang Zhang
  • , Ziyi Lu
  • , Limin Ma*
  • , Guisheng Zou
  • , Fu Guo*
  • *Corresponding author for this work
  • Beijing University of Technology
  • National Taipei University of Technology
  • Tsinghua University
  • Beijing Information Science & Technology University

Research output: Contribution to journalArticlepeer-review

Abstract

Sintering of Cu nanoparticles at low temperature is a promising material for advanced power electronic packaging; while its sintering quality is significantly inhibited by oxides. In this work, the Pt-catalyzed formic acid and decomposition of mixtures of organic compounds and copper formate were utilized to eliminate Cu nanoparticles from oxidation to promote Cu atomic diffusion and form strong bonding. The results indicated that the sintered neck length was longer in the Pt-catalyzed formic acid environment, and the stronger atomic diffusion and interparticle bonding was formed. The shear strength of the sintered Cu–Cu joint reached 49 MPa at 180 °C. Furthermore, the effects of temperature and pressure on the formation and growth of sintered necks, pore eliminations, densification, and bonding strength were discussed. This work could provide industrial insights from realizing low-temperature sintering used in the field of power electronics.

Original languageEnglish
Article number743
JournalJournal of Materials Science: Materials in Electronics
Volume35
Issue number11
DOIs
StatePublished - Apr 2024

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