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Development of novel XY micropositioning stage

  • Huawei Chen*
  • , Dehuai Jiang
  • , Ichiro Hagiwara
  • *Corresponding author for this work
  • Beihang University
  • Institute of Science Tokyo

Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

Abstract

Along with the rapid development of semiconductor, photonics and ultra-precision engineering, ultra-precision positioning stages are becoming more necessary than ever. In this study, one novel XY micropositioning stage is proposed, in which bi-axis circular notch flexure and cantilever hinge mechanism are optimal designed as bearing to provide smooth and guided motion. The theoretical stiffness of stage is provided and verified by FEM analysis. Finally, the micro-positioning stage is built and its resolution is experimentally validated to be less than 4nm.

Original languageEnglish
Title of host publicationKey Engineering Materials
PublisherTrans Tech Publications Ltd
Pages103-106
Number of pages4
ISBN (Print)9780878493388
DOIs
StatePublished - 2009

Publication series

NameKey Engineering Materials
Volume407-408
ISSN (Print)1013-9826
ISSN (Electronic)1662-9795

Keywords

  • 2-DOF
  • Flexure hinge
  • Micropositioning stage
  • PZT

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