Skip to main navigation Skip to search Skip to main content

Dependence of critical stress on temperature and shear strain rate in grain boundary of W

  • Y. Yu
  • , X. Shu
  • , G. H. Lu*
  • *Corresponding author for this work
  • Beihang University

Research output: Contribution to journalArticlepeer-review

Abstract

The coupled grain boundary migration driven by shear stress is considered to be an important factor in grain growth. We carried out a molecular dynamic simulation to investigate the critical stress of this motion in a grain boundary of tungsten. It is revealed that the dependence of critical stress on temperature follows a sigmoidal-like curve at a temperature range from 10 to 1200 K. A high temperature is associated with a small critical stress. The shear strain, however, exhibits an independence of critical stress under the shear rate from 0·1 to 10 m/s-1.

Original languageEnglish
Pages (from-to)S41078-S41081
JournalMaterials Research Innovations
Volume18
DOIs
StatePublished - 1 Jul 2014

Keywords

  • Coupled motion
  • Grain boundary
  • Shear
  • Tungsten

Fingerprint

Dive into the research topics of 'Dependence of critical stress on temperature and shear strain rate in grain boundary of W'. Together they form a unique fingerprint.

Cite this