Abstract
Three kinds of NiTi films with different Ni contents were prepared on ITO coated glass by DC magnetron sputtering. The crystallization kinetics of amorphous films was determined by using non-isothermal single-scan techniques. The results show that the activation energy of crystallization of Ni-rich NiTi film (Ni 51.10 at. pct and Ti 48.90 at. pct) is 715 kJ/mol, while those of two Ti-rich NiTi films are similar. One is 445 kJ/mol (Ni 46.74 at. pct and Ti 53.26 at. pct), and the other is 418 kJ/mol (Ni 43.21 at. pct and Ti 56.79 at. pct), which are lower than that of the Ni-rich film. The difference of kinetic parameters is distinct, which is confirmed by the calculated isothermal kinetics at different temperatures. The thorough research on this phenomenon is in progress.
| Original language | English |
|---|---|
| Pages (from-to) | 421-424 |
| Number of pages | 4 |
| Journal | Journal of Materials Science and Technology |
| Volume | 17 |
| Issue number | 4 |
| State | Published - Jul 2001 |
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