Crystallization behavior of Nd-doped SrBi2Ta2O9 thin films prepared by magnetron sputtering

Yibin Li; Sam Zhang; Weidong Fei; Huili Wang

doi:10.1016/j.tsf.2007.07.054

Crystallization behavior of Nd-doped SrBi₂Ta₂O₉ thin films prepared by magnetron sputtering

Yibin Li
, Sam Zhang^*
, Weidong Fei
, Huili Wang

^*Corresponding author for this work

Nanyang Technological University
Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

Nd-doped SrBi₂Ta₂O₉ thin films are magnetron-sputtered on Pt/Ta/SiO₂/Si substrates. The effect of heating rate on crystallization behavior is investigated with conventional furnace annealing (CFA) and rapid thermal annealing (RTA). Grazing incidence X-ray diffraction and field emission scanning electron microscopy reveal that the crystallization goes through three stages (phases): amorphous, fluorite and finally Aurivillius. Under RTA, the fluorite-to-Aurivillius transformation starts around 100 °C lower than that under CFA. The reasons behind the transformation temperature drop are also discussed.

Original language	English
Pages (from-to)	5252-5257
Number of pages	6
Journal	Thin Solid Films
Volume	516
Issue number	16
DOIs	https://doi.org/10.1016/j.tsf.2007.07.054
State	Published - 30 Jun 2008
Externally published	Yes

Keywords

Crystallization
Phase transformation
RTA
SBT thin film
Structural relaxation

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10.1016/j.tsf.2007.07.054

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title = "Crystallization behavior of Nd-doped SrBi2Ta2O9 thin films prepared by magnetron sputtering",

abstract = "Nd-doped SrBi2Ta2O9 thin films are magnetron-sputtered on Pt/Ta/SiO2/Si substrates. The effect of heating rate on crystallization behavior is investigated with conventional furnace annealing (CFA) and rapid thermal annealing (RTA). Grazing incidence X-ray diffraction and field emission scanning electron microscopy reveal that the crystallization goes through three stages (phases): amorphous, fluorite and finally Aurivillius. Under RTA, the fluorite-to-Aurivillius transformation starts around 100 °C lower than that under CFA. The reasons behind the transformation temperature drop are also discussed.",

keywords = "Crystallization, Phase transformation, RTA, SBT thin film, Structural relaxation",

author = "Yibin Li and Sam Zhang and Weidong Fei and Huili Wang",

year = "2008",

month = jun,

day = "30",

doi = "10.1016/j.tsf.2007.07.054",

language = "英语",

volume = "516",

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journal = "Thin Solid Films",

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T1 - Crystallization behavior of Nd-doped SrBi2Ta2O9 thin films prepared by magnetron sputtering

AU - Li, Yibin

AU - Zhang, Sam

AU - Fei, Weidong

AU - Wang, Huili

PY - 2008/6/30

Y1 - 2008/6/30

N2 - Nd-doped SrBi2Ta2O9 thin films are magnetron-sputtered on Pt/Ta/SiO2/Si substrates. The effect of heating rate on crystallization behavior is investigated with conventional furnace annealing (CFA) and rapid thermal annealing (RTA). Grazing incidence X-ray diffraction and field emission scanning electron microscopy reveal that the crystallization goes through three stages (phases): amorphous, fluorite and finally Aurivillius. Under RTA, the fluorite-to-Aurivillius transformation starts around 100 °C lower than that under CFA. The reasons behind the transformation temperature drop are also discussed.

AB - Nd-doped SrBi2Ta2O9 thin films are magnetron-sputtered on Pt/Ta/SiO2/Si substrates. The effect of heating rate on crystallization behavior is investigated with conventional furnace annealing (CFA) and rapid thermal annealing (RTA). Grazing incidence X-ray diffraction and field emission scanning electron microscopy reveal that the crystallization goes through three stages (phases): amorphous, fluorite and finally Aurivillius. Under RTA, the fluorite-to-Aurivillius transformation starts around 100 °C lower than that under CFA. The reasons behind the transformation temperature drop are also discussed.

KW - Crystallization

KW - Phase transformation

KW - RTA

KW - SBT thin film

KW - Structural relaxation

UR - https://www.scopus.com/pages/publications/43949146255

U2 - 10.1016/j.tsf.2007.07.054

DO - 10.1016/j.tsf.2007.07.054

M3 - 文章

AN - SCOPUS:43949146255

SN - 0040-6090

VL - 516

SP - 5252

EP - 5257

JO - Thin Solid Films

JF - Thin Solid Films

IS - 16

ER -

Crystallization behavior of Nd-doped SrBi₂Ta₂O₉ thin films prepared by magnetron sputtering

Abstract

Keywords

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