Control of cathodic arc spot motion under external magnetic field

Liuhe Li; Ying Zhu; Fushun He; Dandan Dun; Fen Li; Paul K. Chu; Jianzhang Li

doi:10.1016/j.vacuum.2012.10.008

Control of cathodic arc spot motion under external magnetic field

Liuhe Li^*
, Ying Zhu
, Fushun He
, Dandan Dun
, Fen Li
, Paul K. Chu
, Jianzhang Li

^*Corresponding author for this work

School of Mechanical Engineering and Automation

Beihang University
City University of Hong Kong
Chang'an University

Research output: Contribution to journal › Article › peer-review

22 Scopus citations

Abstract

A closed circular transverse magnetic field is designed to control the spot motion of a cathodic arc on a large rectangular target. Stable and controllable spot motion is observed from both graphite and copper. The arc stability, spot velocity, and etched pattern on the cathode surface are studied systematically. Circular tracks are etched on the target surface by the repetitive spot movement and the surface morphology and resistivity of the cathode materials influence the spot velocity.

Original language	English
Pages (from-to)	20-23
Number of pages	4
Journal	Vacuum
Volume	91
DOIs	https://doi.org/10.1016/j.vacuum.2012.10.008
State	Published - 1 May 2013

Keywords

Arc control
Cathode spot
Etched pattern
Transverse magnetic field

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10.1016/j.vacuum.2012.10.008

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title = "Control of cathodic arc spot motion under external magnetic field",

abstract = "A closed circular transverse magnetic field is designed to control the spot motion of a cathodic arc on a large rectangular target. Stable and controllable spot motion is observed from both graphite and copper. The arc stability, spot velocity, and etched pattern on the cathode surface are studied systematically. Circular tracks are etched on the target surface by the repetitive spot movement and the surface morphology and resistivity of the cathode materials influence the spot velocity.",

keywords = "Arc control, Cathode spot, Etched pattern, Transverse magnetic field",

author = "Liuhe Li and Ying Zhu and Fushun He and Dandan Dun and Fen Li and Chu, \{Paul K.\} and Jianzhang Li",

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T1 - Control of cathodic arc spot motion under external magnetic field

AU - Li, Liuhe

AU - Zhu, Ying

AU - He, Fushun

AU - Dun, Dandan

AU - Li, Fen

AU - Chu, Paul K.

AU - Li, Jianzhang

PY - 2013/5/1

Y1 - 2013/5/1

N2 - A closed circular transverse magnetic field is designed to control the spot motion of a cathodic arc on a large rectangular target. Stable and controllable spot motion is observed from both graphite and copper. The arc stability, spot velocity, and etched pattern on the cathode surface are studied systematically. Circular tracks are etched on the target surface by the repetitive spot movement and the surface morphology and resistivity of the cathode materials influence the spot velocity.

AB - A closed circular transverse magnetic field is designed to control the spot motion of a cathodic arc on a large rectangular target. Stable and controllable spot motion is observed from both graphite and copper. The arc stability, spot velocity, and etched pattern on the cathode surface are studied systematically. Circular tracks are etched on the target surface by the repetitive spot movement and the surface morphology and resistivity of the cathode materials influence the spot velocity.

KW - Arc control

KW - Cathode spot

KW - Etched pattern

KW - Transverse magnetic field

UR - https://www.scopus.com/pages/publications/84869861235

U2 - 10.1016/j.vacuum.2012.10.008

DO - 10.1016/j.vacuum.2012.10.008

M3 - 文章

AN - SCOPUS:84869861235

SN - 0042-207X

VL - 91

SP - 20

EP - 23

JO - Vacuum

JF - Vacuum

ER -

Control of cathodic arc spot motion under external magnetic field

Abstract

Keywords

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