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Broadband dispersion optimization enabled by coupled silicon nitride waveguides with a partially etched gap

  • Beihang University
  • Wuhan University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

Partially etched gap is introduced to optimize the dispersion performance of coupled silicon nitride waveguides. Anomalous low dispersion over a 220 nm range around 1500 nm can be realized with 515 nm-thick SiN waveguides.

Original languageEnglish
Title of host publicationFrontiers in Optics, FiO_2019
PublisherOptica Publishing Group (formerly OSA)
ISBN (Print)9781943580675
DOIs
StatePublished - 2019
EventFrontiers in Optics, FiO_2019 - Washington, United States
Duration: 15 Sep 2019 → 19 Sep 2019

Publication series

NameOptics InfoBase Conference Papers
VolumePart F144-FiO 2019
ISSN (Electronic)2162-2701

Conference

ConferenceFrontiers in Optics, FiO_2019
Country/TerritoryUnited States
CityWashington
Period15/09/19 → 19/09/19

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