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Block copolymer films with free interfaces: Ordering by nanopatterned substrates

  • Xingkun Man*
  • , David Andelman
  • , Henri Orland
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

We study block copolymers (BCPs) on patterned substrates, where the top polymer film surface is not constrained but is free and can adapt its shape self-consistently. In particular, we investigate the combined effect of free interface undulations with wetting of the BCP film as induced by nanopatterned substrates. Under wetting conditions and for a finite volume of BCP material, we find equilibrium droplets composed of coexisting perpendicular and parallel lamellar domains. The self-assembly of BCPs on topographic patterned substrates is also investigated and it is found that the free interface induces mixed morphologies of parallel and perpendicular domains coupled with a nonflat free interface. Our study has some interesting consequences for experimental setups of graphoepitaxy and nanoimprint lithography.

Original languageEnglish
Article number010801
JournalPhysical Review E - Statistical, Nonlinear, and Soft Matter Physics
Volume86
Issue number1
DOIs
StatePublished - 12 Jul 2012
Externally publishedYes

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