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Anisotropy effect of crater formation on single crystal silicon surface under intense pulsed ion beam irradiation

  • Jie Shen
  • , Xiao Yu
  • , Jie Zhang
  • , Haowen Zhong
  • , Xiaojun Cui
  • , Guoying Liang
  • , Xiang Yu
  • , Wanying Huang
  • , Ijaz Shahid
  • , Xiaofu Zhang
  • , Sha Yan
  • , Xiaoyun Le*
  • *Corresponding author for this work
  • Beihang University
  • Tomsk Polytechnic University
  • Peking University

Research output: Contribution to journalArticlepeer-review

Abstract

Due to the induced extremely fast thermal and dynamic process, Intense Pulsed Ion Beam (IPIB) is widely applied in material processing, which can bring enhanced material performance and surface craters as well. To investigate the craters’ formation mechanism, a specific model was built with Finite Element Methods (FEM) to simulate the thermal field on irradiated single crystal silicon. The direct evidence for the existence of the simulated 6-fold rotational symmetric thermal distribution was provided by electron microscope images obtained on single crystal silicon. The correlation of the experiment and simulation is of great importance to understand the interaction between IPIB and materials.

Original languageEnglish
Pages (from-to)7-12
Number of pages6
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume421
DOIs
StatePublished - 15 Apr 2018

Keywords

  • Crater
  • Finite element method
  • Intense pulsed ion beam
  • Single crystal silicon
  • Thermal field

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