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Analysis of on-chip metal micro-electrode for CMOS ISFETs

  • Beihang University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this paper the usage of an on-chip metal electrode for CMOS ISFET has been analysed. It is firstly shown that metal electrode can not provide constant potential as other conventional electrodes. Besides that this paper demonstrates the ions distribution and its corresponding deviated potential when ISFETs are detecting extreme small volume. Finally a 2-D simulation result indicates the potential gradient when a vertical on-chip electrode is applied and suggests that a minimum distance of 2um is desired for robust ISFET design with on-chip electrode.

Original languageEnglish
Title of host publication2019 IEEE International Symposium on Circuits and Systems, ISCAS 2019 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781728103976
DOIs
StatePublished - 2019
Event2019 IEEE International Symposium on Circuits and Systems, ISCAS 2019 - Sapporo, Japan
Duration: 26 May 201929 May 2019

Publication series

NameProceedings - IEEE International Symposium on Circuits and Systems
Volume2019-May
ISSN (Print)0271-4310

Conference

Conference2019 IEEE International Symposium on Circuits and Systems, ISCAS 2019
Country/TerritoryJapan
CitySapporo
Period26/05/1929/05/19

Keywords

  • Chemical sensor
  • ISFET
  • Metal Electrode
  • On-chip Electrode

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