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Ab InitioStudy of Hexagonal Boron Nitride as the Tunnel Barrier in Magnetic Tunnel Junctions

  • Haichang Lu
  • , Yuzheng Guo
  • , John Robertson*
  • *Corresponding author for this work
  • University of Cambridge
  • Swansea University

Research output: Contribution to journalArticlepeer-review

Abstract

Two-dimensional hexagonal boron nitride (h-BN) is studied as a tunnel barrier in magnetic tunnel junctions (MTJs) as a possible alternative to MgO. The tunnel magnetoresistance (TMR) of such MTJs is calculated as a function of whether the interface involves the chemi- or physisorptive site of h-BN atoms on the metal electrodes, Fe, Co, or Ni. It is found that the physisorptive site on average produces higher TMR values, whereas the chemisorptive site has the greater binding energy but lower TMR. It is found that alloying the electrodes with an inert metal-like Pt can induce the preferred absorption site on Co to become a physisorptive site, enabling a higher TMR value. It is found that the choice of physisorptive sites of each element gives more Schottky-like dependence of their Schottky barrier heights on the metal work function.

Original languageEnglish
Pages (from-to)47226-47235
Number of pages10
JournalACS Applied Materials and Interfaces
Volume13
Issue number39
DOIs
StatePublished - 6 Oct 2021

Keywords

  • Fermi level pinning
  • Schottky barrier height
  • ab initio calculation
  • hexagonal boron nitride
  • magnetic tunnel junctions
  • tunnel magnetoresistance

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