Abstract
(Cu1-xAgx)2O oxide films with cuprite structure are presented. The p-type film demonstrates an exceptional increase in hole cconcentration up to 1.18×1021cm-3 with increasing Ag to 33at.%. It is revealed from high-resolution transmission electron microscopy along with X-ray diffraction analysis that the oxide remains a single phase with the Ag content up to 33at.%. Raman spectroscopy measurements exhibit different symmetrical features for the oxide than those of Cu2O. This suggests that the valence-band edge level can be raised as a result of the incorporation of Ag1+ into Cu2O, which is verified by the small acceptor ionization energy observed for the (Cu 0.67Ag0.33)2O. In addition, the coexistence of Cu1+ and Ag1+ is shown to suppress variable-range-hopping conduction, demonstrating weakly degenerate semiconductor behavior.
| Original language | English |
|---|---|
| Pages (from-to) | 1545-1549 |
| Number of pages | 5 |
| Journal | Physica Status Solidi (A) Applications and Materials Science |
| Volume | 211 |
| Issue number | 7 |
| DOIs | |
| State | Published - Jul 2014 |
Keywords
- carrier concentration
- electrical transport
- oxides
- p-type semiconductors
- structure
- thin films
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