A high-bandwidth end-effector with active force control for robotic polishing

  • Jian Li
  • , Yisheng Guan*
  • , Haowen Chen
  • , Bing Wang
  • , Tao Zhang*
  • , Xineng Liu
  • , Jie Hong
  • , Danwei Wang
  • , Hong Zhang
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

To promote operational intelligence, improve surface quality, and reduce manpower dependence, a novel high-bandwidth end-effector with active force control for robotic polishing was proposed. Using this end-effector as a mini robot, a macro-mini robot for polishing processing was constructed, in which the macro robot provides posture control during polishing operations, whereas the mini-robot provides constant force control. By minimizing the inertia along the spindle in this configuration, the end-effector obtains a force control bandwidth of 200 Hz. Through a series of comparative experiments with different contact forces and feed rates, the proposed design was proven to have a smaller overshoot, a faster response, and a shorter settling time than the conventional method based on macro robot (KUKA iiwa) controlled force. The roughness of the workpiece reached 0.4 µm after polishing with the macro-mini robot, indicating the efficiency of this end-effector in high-precision material removal and surface polishing operations.

Original languageEnglish
Pages (from-to)169122-169135
Number of pages14
JournalIEEE Access
Volume8
DOIs
StatePublished - 2020
Externally publishedYes

Keywords

  • End-effector
  • Force control
  • High-bandwidth
  • Macro-mini robot
  • Robotic polishing

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