Abstract
The crystal orientation of hard coatings is affected by many factors, the mechanism of which is controversial. Cr interlayer and Cr2O3 coatings with different thickness were deposited by vacuum cathodic arc deposition on cemented carbide YT15, single crystalline silicon and high speed steel (HSS). The morphology of the cross section was obtained by Scanning electron microscope (SEM). The crystal orientation of the coatings was studied by X-ray diffraction (XRD). The study showed that [006] is the preferred orientation at the early stage of deposition; The application of substrate bias during the deposition of interlayer can decrease the relative intensity of [006] orientation by more than 27%; Small crystalline size of substrate can suppress [006] orientation and benefit [104] and [116] orientations. As the coatings grow thicker, relative intensity of [006] showed a decline of 21%~44%, while for [104] and [116], the relative intensity increased 11%~19% and 11%~25% respectively. Further analysis of the crystal orientation shows that it is consistent with the principle of surface energy minimization and influenced by conditions of crystallization and grain growth.
| Translated title of the contribution | Effects of Substrate, Interlayer Bias and Coating Thickness on Crystal Orientation of Chromium Oxide Coatings |
|---|---|
| Original language | Chinese (Traditional) |
| Pages (from-to) | 73-83 |
| Number of pages | 11 |
| Journal | Zhongguo Biaomian Gongcheng/China Surface Engineering |
| Volume | 33 |
| Issue number | 1 |
| DOIs | |
| State | Published - 23 Feb 2020 |
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