基于混合本征模匹配的光刻掩膜分析方法研究

Implicit mode matching is a populär analyzing method for waveguide structures in computational electromagnetic. This paper discusses the limitation of conventional implicit mode matching method for solving computational lithography problems. Based on the existing implicit mode matching method, a hybrid eigenmode restoration algorithm based on Krylov subspace theory and a explicit mode matching method are proposed. The eigenmode accuracy loss caused by Lanczos method and other problems are solved while preserving the OCJV1'5) complexity. Benchmark cases for representative waveguide and periodic structures verify the restored eigenmode accuracy and efficiency characters of the proposed method. A Simulation case for highly complicated lithography mask structure is presented, and results compared with high frequency structure Simulator (HFSS) Software and rigorous coupled wave analysis (RCWA) method indicate the application significance of the proposed method in solving highly complicated computational lithography problems.