双极高功率脉冲磁控溅射技术薄膜制备研究进展

As an extensive attention in the industry, the bipolar pulsed high power impulse magnetron sputtering (BP-HiPIMS) is carried out at a high ionization rate of target particles and high density plasma vapor, and employs a "pump out" positive pulse voltage to control the energy and flux of ions, in this way to improve the properties of deposited films. BP-HiPIMS has a more significant advantage in the preparation of insulating substrates or films which cannot be biased, while the problem of rapid charging of floated substrate can be overcome by the substrate grounded, thus contributing to the diffusion and energy enhancement of deposited ions to the downstream. The application of BP-HiPIMS with relatively short interval of positive and negative pulse, negative pulse duration and high positive pulse voltage amplitude is conductive to optimizing the properties of the films. In recent years, the focus is paid on the various films with relatively excellent properties prepared via the advanced BP-HiPIMS approach. In summary, compared with the films treated by the conventional HiPIMS discharge, the mechanical properties of the Cu, DLC, TiN, CrN films prepared by the BP-HiPIMS are effectively improved. However, the increase in film deposition rate is divergent in different experiments which needs to be further explored.